Ion etching of growing InP nanocrystals using microwave
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United States of America Patent
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May 7, 2013
Grant Date -
Feb 21, 2013
app pub date -
Oct 5, 2012
filing date -
Jul 10, 2008
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Abstract
High quantum yield InP nanocrystals are used in the bio-technology, bio-medical, and photovoltaic, specifically IV, III-V and III-VI nanocrystal technological applications. InP nanocrystals typically require post-generation HF treatment. Combining microwave methodologies with the presence of a fluorinated ionic liquid allows Fluorine ion etching without the hazards accompanying HF. Growing the InP nanocrystals in the presence of the ionic liquid allows in-situ etching to be achieved. The optimization of the PL QY is achieved by balancing growth and etching rates in the reaction.
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