Impermeable PVD Target Coating for Porous Target Materials
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United States of America Patent
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Issued Date -
Feb 28, 2013
app pub date -
Aug 29, 2011
filing date -
Aug 29, 2011
priority date (Note) -
Abandoned
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Abstract
A method of making a sputtering target includes forming a sputtering target containing a relatively porous sputtering material. The sputtering material may be initially formed to be substantially free of water or treated to remove substantially all of absorbed or adsorbed water from the sputtering material. The method also includes forming a water impermeable barrier layer over the substantially water free sputtering material to completely or substantially prevent re-absorption or re-adsorption of water in the sputtering material.
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