Monocrystalline epitaxially aligned nanostructures and related methods

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United States of America Patent

PATENT NO 10472229
APP PUB NO 20130052421A1
SERIAL NO

13582525

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Abstract

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A method for fabricating a nanostructure utilizes a templated monocrystalline substrate. The templated monocrystalline substrate is energetically (i.e., preferably thermally) treated, with an optional precleaning and an optional amorphous material layer located thereupon, to form a template structured monocrystalline substrate that includes the monocrystalline substrate with a plurality of epitaxially aligned contiguous monocrystalline pillars extending therefrom. The monocrystalline substrate and the plurality of epitaxially aligned contiguous monocrystalline pillars may comprise the same or different monocrystalline materials. The method provides the nanostructure where when the monocrystalline substrate and the plurality of epitaxial aligned contiguous monocrystalline pillars comprise different monocrystalline materials having a bulk crystal structure mismatch of up to about 10 percent, lattice mismatch induced crystal structure defects may be avoided interposed between the monocrystalline substrate and the plurality of epitaxially aligned contiguous monocrystalline pillars, which may have an irregular sidewall shape.

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Patent Owner(s)

Patent OwnerAddress
CORNELL UNIVERSITY395 PINE TREE ROAD SUITE 310 ITHACA NY 14850

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Arora, Hitesh Ithaca, US 18 498
Thompson, Michael Ithaca, US 171 2599
Wiesner, Ulrich Ithaca, US 52 4695

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