SUBSTRATE CLEANING METHOD AND SEMICONDUCTOR MANUFACTURING APPARATUS
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United States of America Patent
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Issued Date -
Mar 7, 2013
app pub date -
Feb 23, 2011
filing date -
Mar 9, 2010
priority date (Note) -
Abandoned
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Abstract
A substrate cleaning method for cleaning a substrate on which a film is formed with a pattern in a vacuum-state processing chamber includes a preprocessing step where the film formed on the substrate on which the pattern has been formed by an etching process is cleaned by using a cleaning gas; and a consecutive step including an oxidation step where residues attached on a surface of the pattern are oxidized by using an oxidizing gas and a reduction step where the oxidized residues are reduced by using a reducing gas, which are consecutively carried out posterior to the preprocessing step. The gases used in the preprocessing step and the consecutive step are clustered by ejecting the gases into the processing chamber from a gas nozzle whose internal pressure PS is maintained to be higher than an internal pressure PO of the processing chamber.
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