Device for forming a reduced chamber space, and method for positioning multilayer bodies
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United States of America Patent
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May 31, 2016
Grant Date -
Mar 21, 2013
app pub date -
Feb 22, 2011
filing date -
Feb 23, 2010
priority date (Note) -
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status (Latency Note)
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Abstract
A device for forming a reduced chamber space, which is a process box or a process hood, containing an apparatus, which positions at least two multilayer bodies each including a surface to be processed, wherein the apparatus is designed such that the multilayer bodies are opposite to each other, wherein the surfaces to be processed are facing away from each other such that the multilayer bodies can be processed as a multilayer body arrangement in a processing system. In addition, a method for positioning the two multilayer bodies comprising a surface to be processed, with the two multilayer bodies disposed in such a device such that multilayer bodies are opposite each other, wherein the surfaces to be processed are facing away from each other, such that the multilayer bodies are processable as a multilayer body arrangement in a processing system.
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