RESIST COMPOSITION AND METHOD OF FORMING RESIST PATTERN
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United States of America Patent
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Issued Date -
Mar 21, 2013
app pub date -
Sep 14, 2012
filing date -
Sep 20, 2011
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Abandoned
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Abstract
A resist composition for use with EUV or EB including:
- a resin component (C) containing at least one type of atom selected from the group consisting of a fluorine atom and a silicon atom, an aromatic group, and a polarity conversion group that decomposes by action of base to increase the polarity; anda resin component (A) that generates acid upon exposure and exhibits changed solubility in a developing solution under action of acid (excluding the aforementioned resin component (C)),wherein an amount of a structural unit having the aforementioned aromatic group in the aforementioned resin component (C) is at least 20 mol %.
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