DIFFUSION BARRIER AND METHOD OF FORMATION THEREOF
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United States of America Patent
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app pub date -
Nov 29, 2012
filing date -
Jun 24, 2008
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Abandoned
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Abstract
A method of forming a device is presented. The method includes providing a structure having first and second regions. A diffusion barrier is formed between at least a portion of the first and second regions. The diffusion barrier comprises cavities that reduce diffusion of elements between the first and second regions.
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