Resist composition, method of forming resist pattern, polymeric compound, and compound

Number of patents in Portfolio can not be more than 2000

United States of America Patent

PATENT NO 9023581
APP PUB NO 20130089819A1
SERIAL NO

13703865

Stats

ATTORNEY / AGENT: (SPONSORED)

Importance

Loading Importance Indicators... loading....

Abstract

See full text

A resist composition which can form a very fine resist pattern with excellent lithography properties, a new polymeric compound useful for the resist composition, and a compound useful as a monomer for the polymeric compound. The resist composition contains a polymeric compound containing a structural unit (a0) represented by general formula (a0) shown below. In the formula (a0), A is an anion represented by the general formula (1) or (2).

Loading the Abstract Image... loading....

First Claim

See full text

Family

Loading Family data... loading....

Patent Owner(s)

Patent OwnerAddress
TOKYO OHKA KOGYO CO LTDKAWASAKI-SHI KANAGAWA 211 0012

International Classification(s)

Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Dohtani, Kazushige Kawasaki, JP 3 28
Iwashita, Jun Kawasaki, JP 41 379
Kawaue, Akiya Kawasaki, JP 52 480
Konno, Kenri Kawasaki, JP 21 82
Shiono, Daiju Kawasaki, JP 71 860
Takaki, Daichi Kawasaki, JP 29 141
Utsumi, Yoshiyuki Kawasaki, JP 88 732

Cited Art Landscape

Load Citation

Patent Citation Ranking

Forward Cite Landscape

Load Citation

Maintenance Fees

Fee Large entity fee small entity fee micro entity fee due date
11.5 Year Payment $7400.00 $3700.00 $1850.00 Nov 5, 2026
Fee Large entity fee small entity fee micro entity fee
Surcharge - 11.5 year - Late payment within 6 months $160.00 $80.00 $40.00
Surcharge after expiration - Late payment is unavoidable $700.00 $350.00 $175.00
Surcharge after expiration - Late payment is unintentional $1,640.00 $820.00 $410.00