PATTERN INSPECTION DEVICE AND PATTERN INSPECTION METHOD
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United States of America Patent
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Issued Date -
Apr 18, 2013
app pub date -
Apr 13, 2011
filing date -
Apr 13, 2010
priority date (Note) -
Abandoned
status (Latency Note)
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Abstract
Disclosed is a pattern inspection device for inspecting a bit pattern of a disk medium having a plurality of tracks which are concentrically formed on the disk medium, the bit pattern on each track being spaced for each bit in radial and circumferential directions, the pattern inspection device including: a rotating stage on which the disk medium is placed; an irradiating optical system for radiating an electron beam onto the disk medium that rotates together with the rotating stage; and an electron detector for detecting electrons generated from the disk medium on the rotating stage by the irradiation of the electron beam of the irradiating optical system, wherein a spot diameter of the electron beam of the irradiating optical system is set not less than a diameter of the bit pattern.
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