PHOTORESIST COMPOSITION

United States of America Patent

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Issued Date
Apr 18, 2013
app pub date
Oct 12, 2012
filing date
Oct 17, 2011

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Abandoned

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Abstract

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A photoresist composition which comprises

a resin comprising a structural unit represented by formula (aa):

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Patent Owner(s)

Patent Owner	Address
SUMITOMO CHEMICAL COMPANY LIMITED	TOKYO 103-6020

International Classification(s)

G03F:PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNE....

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[Patents Count]

Inventor(s)

Inventor Name	Address	# of filed Patents	Total Citations
ICHIKAWA, Koji	Osaka-shi, JP	316	1995
SHIMADA, Masahiko	Osaka-shi, JP	81	454
YAMAGUCHI, Satoshi	Osaka-shi, JP	243	2585

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United States of America Patent

13650485

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13650485

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