Importance

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Abstract

The present invention relates to a resist composition for EUV or EB containing a base component (A) which generates acid upon exposure and exhibits changed solubility in a developing solution by the action of acid, and a resin component (W) that contains at least one atom selected from a fluorine atom or a silicon atom and contains a polarity conversion group that exhibits increased polarity after decomposition by the action of base, wherein the base component (A) contains a component (A1) which contains a structural unit (a0) having a group represented by general formula (a0-1) or (a0-2) shown below, and the amount of the resin component (W) relative to 100 parts by weight of the base component (A) is 1 to 15 parts by weight. In the formulas, Q¹ and Q² represents a single bond or a divalent linking group; R³ to R⁵ represents an organic group, and —R³—S⁺(R⁴)(R⁵) has one aromatic ring or no aromatic ring in total; V⁻ represents a counteranion; A⁻ represents an organic group containing an anion moiety; and M^m+ represents a mono- to tri-valent organic cation, provided that M^m+ has one aromatic ring or no aromatic ring.

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First Claim