Internal Split Faraday Shield for an Inductively Coupled Plasma Source
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United States of America Patent
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app pub date -
Oct 19, 2011
filing date -
Oct 19, 2011
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Abstract
An inductively coupled plasma source for a focused charged particle beam system includes a conductive shield within the plasma chamber in order to reduce capacitative coupling to the plasma. The internal conductive shield is maintained at substantially the same potential as the plasma source by a biasing electrode or by the plasma. The internal shield allows for a wider variety of cooling methods on the exterior of the plasma chamber.
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