Multilayer structure based on a negative differential resistance material
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United States of America Patent
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May 20, 2014
Grant Date -
Apr 25, 2013
app pub date -
Oct 25, 2011
filing date -
Oct 25, 2011
priority date (Note) -
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Abstract
A multilayer structure is disclosed that includes a conductive layer, a layer of a negative differential resistance (NDR) material disposed above the conductive layer, a layer M2 disposed above the NDR material, a second layer of NDR material disposed above layer M2, and a conductive layer disposed above the second NDR layer. Layer M2 can include a conductive material interspersed with regions of a dielectric material or a layer of the dielectric material and regions of the conductive material disposed above and below the dielectric material.
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