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United States of America Patent

APP PUB NO 20130101863A1
SERIAL NO

13641985

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Abstract

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A resin composition that can allow allowing a drying step after impregnation coating of a prepreg and lamination pressing performed at low temperatures in a short time and, at the same time, can maintain storage stability of the prepreg, comprises (A) an imidazole compound represented by formula (I), (B) an epoxy compound, and (C1) a cyanate compound or (C2) a BT resin. R1 and R2 represent an alkyl group, an alkenyl group an alkoxyl group, or a substituted or unsubstituted aromatic substituent; and R3 represents hydrogen, an alkyl group, an alkenyl group, an alkoxy group, a substituted or unsubstituted aromatic substituent, or a halogen group.

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Patent Owner(s)

Patent OwnerAddress
MITSUBISHI GAS CHEMICAL COMPANY INC5-2 MARUNOUCHI 2-CHOME CHIYODA-KU TOKYO 1008324 ?1008324

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Arii, Kenji Kashiwa-shi, JP 6 24
Fukasawa, Emi Kashiwa-shi, JP 2 13
Mabuchi, Yoshinori Noda-shi, JP 15 79
Ohtsuka, Hajime Kamisu-shi, JP 3 27
Sogame, Masanobu Matsudo-shi, JP 19 99

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