Methods of forming patterns
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United States of America Patent
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Apr 22, 2014
Grant Date -
Apr 25, 2013
app pub date -
Dec 11, 2012
filing date -
Mar 3, 2009
priority date (Note) -
In Force
status (Latency Note)
Importance
Abstract
Some embodiments include methods of forming patterns of openings. The methods may include forming spaced features over a substrate. The features may have tops and may have sidewalls extending downwardly from the tops. A first material may be formed along the tops and sidewalls of the features. The first material may be formed by spin-casting a conformal layer of the first material across the features, or by selective deposition along the features relative to the substrate. After the first material is formed, fill material may be provided between the features while leaving regions of the first material exposed. The exposed regions of the first material may then be selectively removed relative to both the fill material and the features to create the pattern of openings.
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