Method of cleaning aluminum plasma chamber parts
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United States of America Patent
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Oct 1, 2013
Grant Date -
May 2, 2013
app pub date -
Oct 31, 2011
filing date -
Oct 31, 2011
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Abstract
A method of cleaning a surface of a component of a plasma chamber, wherein the component has an aluminum or anodized aluminum surface, the method including the steps of: soaking the surface of the component in a diluted sulfuric peroxide (DSP) solution; spray rinsing the surface with water following removal of the surface from the DSP solution; soaking the surface in a dilute nitric acid (HNO3) solution; spray rinsing the surface with water following removal of the surface from the dilute nitric acid solution; and repeating at least twice the steps of soaking the surface in dilute nitric acid followed by spray rinsing the surface.
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