Mask blank and method of manufacturing an imprinting mold

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United States of America Patent

PATENT NO 8883022
SERIAL NO

13641220

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ATTORNEY / AGENT: (SPONSORED)

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Abstract

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Provided is a mask blank which is used for manufacturing an imprinting mold and which may form a fine mold pattern with high pattern accuracy. A mask blank (10) includes a transparent substrate (1) and a thin film (2) contacted with a surface of the substrate. The thin film (2) includes a laminated film including an upper layer (4) which is composed of a material containing silicon (Si) or a material containing tantalum (Ta), and a lower layer (3) which is composed of a material containing at least one of hafnium (Hf) and zirconium (Zr) and containing substantially no oxygen.

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Patent Owner(s)

Patent OwnerAddress
HOYA CORPORATION6-10-1 NISHI-SHINJUKU SHINJUKU-KU TOKYO 1608347 ?1608347

International Classification(s)

Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Hashimoto, Masahiro Shinjuku-ku, JP 99 970
Nozawa, Osamu Shinjuku-ku, JP 129 1014

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