IMPRINT APPARATUS, IMPRINT METHOD, IMPRINT SYSTEM, AND DEVICE MANUFACTURING METHOD
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United States of America Patent
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Issued Date -
May 2, 2013
app pub date -
Oct 23, 2012
filing date -
Oct 27, 2011
priority date (Note) -
Abandoned
status (Latency Note)
Importance
Abstract
A imprint apparatus that brings a pattern formed on a mold into contact with an imprint material supplied to a substrate to transfer the pattern to the imprint material includes an emission unit configured to emit excitation light for causing a luminescent material to emit light, a detection unit configured to detect light, and a mold holding unit configured to hold the mold including the luminescent material, in which, after the pattern is transferred to the imprint material, the emission unit emits the excitation light to the pattern transferred to the imprint material, and the detection unit detects light emitted from the luminescent material remaining in the imprint material.
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