Overlay target geometry for measuring multiple pitches
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United States of America Patent
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Jul 18, 2017
Grant Date -
May 2, 2013
app pub date -
Apr 13, 2012
filing date -
Nov 1, 2011
priority date (Note) -
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Abstract
An overlay target for use in imaging based metrology is disclosed. The overlay target includes a plurality of target structures including three or more target structures, each target structure including a set of two or more pattern elements, wherein the target structures are configured to provide metrology information pertaining to different pitches, different coverage ratios, and linearity. Pattern elements may be separated from adjacent pattern elements by non-uniform distance; pattern elements may have non-uniform width; or pattern elements may be designed to demonstrate a specific offset as compared to pattern elements in a different layer.
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