DIFFUSING AGENT COMPOSITION AND METHOD OF FORMING IMPURITY DIFFUSION LAYER
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United States of America Patent
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Issued Date -
May 2, 2013
app pub date -
Jul 6, 2011
filing date -
Jul 9, 2010
priority date (Note) -
Abandoned
status (Latency Note)
Importance
Abstract
Provided is a diffusing agent composition used for the printing of a dopant component on a semiconductor substrate, the diffusing agent composition including a silicon compound (A), a dopant component (B), and a non-dopant metal component (C). Among these components, the content of Na contained as the non-dopant metal component (C) is less than 60 ppb relative to the total amount of the composition.
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