Manufacturing method of semiconductor device

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United States of America Patent

PATENT NO 9017636
APP PUB NO 20130109170A1
SERIAL NO

13705778

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Abstract

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A deposition method of fine particles, includes the steps of irradiating a fine particle beam formed by size-classified fine particles to an irradiated subject under a vacuum state, and depositing the fine particles on a bottom part of a groove structure formed at the irradiated subject.

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Patent Owner(s)

Patent OwnerAddress
FUJITSU LIMITEDKAWASAKI-SHI

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Awano, Yuji Kawasaki, JP 34 768
Sato, Shintaro Kawasaki, JP 73 454
Shimizu, Noriyoshi Kawasaki, JP 139 1576

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