PROCESS VARIATION-BASED MODEL OPTIMIZATION FOR METROLOGY
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United States of America Patent
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May 2, 2013
app pub date -
Oct 31, 2011
filing date -
Oct 31, 2011
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Abstract
Process variation-based model optimization for metrology is described. For example, a method includes determining a first model of a structure. The first model is based on a first set of parameters. A set of process variations data is determined for the structure. The first model of the structure is modified to provide a second model of the structure based on the set of process variations data. The second model of the structure is based on a second set of parameters different from the first set of parameters. A simulated spectrum derived from the second model of the structure is then provided.
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