DESIGN DATA OPTIMIZATION METHOD, STORAGE MEDIUM INCLUDING PROGRAM FOR DESIGN DATA OPTIMIZATION METHOD AND PHOTOMASK MANUFACTURING METHOD
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United States of America Patent
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Issued Date -
May 2, 2013
app pub date -
Mar 22, 2012
filing date -
Nov 2, 2011
priority date (Note) -
Abandoned
status (Latency Note)
Importance
Abstract
According to one embodiment, a design data optimization method includes forming an angular aperture model, in first design data including a first and a second line patterns indicating an interconnect layout, based on an angular aperture between the first line pattern in which a conversion difference prediction point is set in a vertical direction and the second line pattern, and changing a distance between the first and second line patterns or a line width of the first and second line patterns in the first design data based on the angular aperture model and optimizing the first design data to second design data including the first and second line patterns changed.
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