SIMULATED GAS SUPPLY DEVICE
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United States of America Patent
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Issued Date -
May 16, 2013
app pub date -
Nov 12, 2012
filing date -
Nov 10, 2011
priority date (Note) -
Abandoned
status (Latency Note)
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Abstract
The present invention is one that, while suppressing a temperature variation of simulated gas supplied to a test target, changes a flow rate of the simulated gas supplied to the test target, and provided with: a first gas supply path 2; a first gas heating part 4 that is connected with the first gas supply path 2 and heats the first gas; a simulated gas supply path 6 that supplies the simulated gas generated by heating by the first gas heating part 4 to the test target; and a simulated gas discharge path 7 that, without supplying the simulated gas generated by heating by the first gas heating part 4 to the test target, discharges the simulated gas outside, wherein by controlling a discharge flow rate of the simulated gas through the simulated gas discharge path 7, a supply flow rate of the simulated gas supplied from the simulated gas supply path 6 to the test target is controlled.
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