Sputtering target, transparent conductive film and transparent electrode

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United States of America Patent

PATENT NO 8920683
APP PUB NO 20130118774A1
SERIAL NO

13713771

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Abstract

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A sputtering target which is composed of a sintered body of an oxide which contains at least indium, tin, and zinc and includes a spinel structure compound of Zn2SnO4 and a bixbyite structure compound of In2O3. A sputtering target includes indium, tin, zinc, and oxygen with only a peak ascribed to a bixbyite structure compound being substantially observed by X-ray diffraction (XRD).

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Patent Owner(s)

Patent OwnerAddress
IDEMITSU KOSAN CO LTDTOKYO 100-8321

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Inoue, Kazuyoshi Sodegaura, JP 118 4436
Kaijo, Akira Sodegaura, JP 6 143
Tanaka, Nobuo Sodegaura, JP 67 2016
Umeno, Satoshi Sodegaura, JP 8 72
Yano, Koki Sodegaura, JP 85 4057

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