METHOD AND SYSTEM FOR FORMING ALIGNMENT FILM REGION THROUGH UV LIGHT EXPOSURE
Number of patents in Portfolio can not be more than 2000
United States of America Patent
Stats
-
N/A
Issued Date -
May 16, 2013
app pub date -
Nov 17, 2011
filing date -
Nov 14, 2011
priority date (Note) -
Abandoned
status (Latency Note)
Importance
Abstract
A method and a system for forming an alignment film region through ultraviolet (UV) light exposure are disclosed. The method comprises the following steps of: coating a polyimide (PI) solution on a substrate to form an alignment film that covers a predetermined alignment film region on the substrate; placing a mask—above the alignment film; peeling off portions of the alignment film on the substrate that are located outside the predetermined alignment film region through exposure to a UV light; and removing the mask to obtain the alignment film. The present disclosure can effectively improve-the problems of printing offsets, sawtooth-like edge irregularities and uneven film thicknesses caused when the alignment film region is coated by an alignment film inkjet printer. This improves the positioning precision of the alignment film region and the quality of the alignment film, thus improving the image quality of the LCD device.
First Claim
Family
International Classification(s)
Cited Art Landscape
Patent Citation Ranking
Advertisement
Advertisement
Advertisement
Recipient Email Address
Recipient Email Address
Comment
Recipient Email Address
Add to Portfolio(s)
To add this patent to one, or more, of your portfolios, simply click the add button.
This Patent is in these Portfolios:
Add to additional portfolios:
Last Refreshed On:
Changes done successfully