Importance

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Abstract

An exposure system for generating exposed structures in a photosensitive layer arranged on an object is provided. The exposure system has an object carrier accommodating the object and an exposure device, which are movable relative to one another. Exposure beams exit from the exposure device, with each of which an exposure spot can be generated on the photosensitive layer by means of an imaging unit in a position controlled manner. At least one first exposure unit generating a set of first exposure beams and at least one second exposure unit generating a set of second exposure beams is associated with at least one deflecting element, first and second exposure beams of these exposure units being deflectable by the same deflecting element. Mirror surface areas for the first exposure beams and for the second exposure beams are arranged on the deflecting element offset relative to one another in a row direction.

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First Claim