Position measurement apparatus and exposure apparatus which measure position of object using reference mark, and method of manufacturing device
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United States of America Patent
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Jul 26, 2016
Grant Date -
May 16, 2013
app pub date -
Nov 8, 2012
filing date -
Nov 15, 2011
priority date (Note) -
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status (Latency Note)
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Abstract
A position measurement apparatus that measures a position of an object using a reference mark includes a first illumination optical system configured to illuminate the object using measurement light from a light source which emits light of a first wavelength band, a second illumination optical system configured to illuminate the reference mark using reference light of a second wavelength band, and a position measurement unit configured to detect light from the object and light from the reference mark and to obtain the position of the object based on the detection result, and the second wavelength band of the reference light is set between an upper limit and a lower limit of the first wavelength band of the measurement light from the light source.
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