POLYCRYSTALLINE SILICON INGOT MANUFACTURING APPARATUS, POLYCRYSTALLINE SILICON INGOT MANUFACTURING METHOD, AND POLYCRYSTALLINE SILICON INGOT

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United States of America Patent

APP PUB NO 20130122278A1
SERIAL NO

13811119

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Abstract

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A polycrystalline silicon ingot manufacturing apparatus, a polycrystalline silicon ingot manufacturing method, and a polycrystalline silicon ingot are provided. The apparatus comprises: a crucible having a rectangular shape in a cross-section; an upper heater provided above the crucible; and a lower heater provided below the crucible. A silicon melt stored in the crucible is solidified from a bottom surface of the crucible upward unidirectionally. The apparatus further comprises an auxiliary heater that heats at least a bottom-surface-side portion of a sidewall of the crucible. The production yield can be improved by using the apparatus and by reducing the oxygen concentration at the location where the oxygen concentration tends to be high locally at the bottom part of the ingot.

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Patent Owner(s)

Patent OwnerAddress
MITSUBISHI MATERIALS CORPORATIONCHIYODA-KU TOKYO 100-8117
MITSUBISHI MATERIALS ELECTRONIC CHEMICALS CO LTDAKITA-SHI AKITA 010-8585

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Ikeda, Hiroshi Tokyo, JP 368 4841
Kanai, Masahiro Akita-shi, JP 212 4670
Tsuzukihashi, Koji Akita-shi, JP 4 12
Wakita, Saburo Noda-shi, JP 24 305

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