Method of forming photomasks and photomasks formed by the same
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United States of America Patent
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Apr 15, 2014
Grant Date -
May 16, 2013
app pub date -
Sep 4, 2012
filing date -
Nov 15, 2011
priority date (Note) -
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Abstract
A method of manufacturing a photomask includes forming a multi-layer on a substrate and a blank layer on the multi-layer, patterning the blank layer to form openings exposing the multi-layer on a projection region of the substrate, and irradiating at least a portion of the multi-layer exposed by the openings with pulses of light output by a pulse laser whose pulse width is substantially greater than 0.001 seconds. Thus, the photomask has a reflective layer that includes a low-reflectance part corresponding to that part of the multi-layer irradiated by the light output by the pulse laser.
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