Reticle assembly, a lithographic apparatus, the use in a lithographic process, and a method to project two or more image fields in a single scanning movement of a lithographic process
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United States of America Patent
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Sep 22, 2015
Grant Date -
May 23, 2013
app pub date -
Nov 16, 2012
filing date -
Nov 22, 2011
priority date (Note) -
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Abstract
A reticle assembly for use in a lithographic process in which a first image field and a second image field are projected onto a first target portion and a second target portion on a substrate, the reticle assembly being arranged to hold a first reticle having the first image field and a second reticle having the second image field such that a distance between the first and second image fields substantially corresponds to a distance between the first and the second target portions. Embodiments also relate to a lithographic apparatus including the reticle assembly, the use in a lithographic process in which a first image field and a second image field are projected onto a first target portion and a second portion on a substrate, of a first reticle having the first image field and a second reticle having the second image field, wherein a distance between the first and second image fields substantially corresponds to a distance between the first and second target portions.
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