Multi facet mirror of a microlithographic projection exposure apparatus with a tilting actuator

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United States of America Patent

PATENT NO 9041910
APP PUB NO 20130128252A1
SERIAL NO

13747142

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Abstract

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A multi facet mirror of a microlithographic projection exposure apparatus includes a plurality of mirror facet units. Each unit includes a mirror member with a body, a reflective coating provided at one end of the body and an actuating surface provided at an opposite end. The unit further includes a rest member on which the actuating surface rests while the mirror member is not moving, and an actuator that tilts the mirror member about a tilting axis. The actuator has a contact surface and a lifting member which moves the actuating surface along a lifting direction. In a first operating state of the lifting member the actuating surface rests on the rest member and in a second operating state on the contact surface. A displacement member displaces the contact surface along a lateral direction only while the lifting member is in the second operating state.

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Patent Owner(s)

Patent OwnerAddress
CARL ZEISS SMT GMBH73447 OBERKOCHEN

International Classification(s)

Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Hauf, Markus Ulm, DE 64 652
Rassel, Thorsten Huettlingen, DE 14 118

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