Exposure apparatus using microlens array and optical member
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United States of America Patent
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Apr 5, 2016
Grant Date -
May 23, 2013
app pub date -
Jul 26, 2011
filing date -
Aug 30, 2010
priority date (Note) -
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Abstract
An exposure apparatus and an optical member wherein impurities can be prevented from infiltrating between microlens arrays and a substrate, and microlenses can be prevented from being scratched by the impurities and by getting abnormally close to the substrate. Microlens arrays in which pluralities of microlenses are formed are arranged above a transparent substrate, and the microlens arrays are bonded and the end surfaces to a mask. Alignment mark supports are bonded to the mask at both sides of the microlens arrays, and alignment marks are formed in the surfaces of the alignment mark supports that face the substrate. The spaces between the alignment mark supports and the substrate are smaller than the spaces between the microlens arrays and the substrate.
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