Lithographic apparatus and device manufacturing method

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United States of America Patent

PATENT NO 9195153
APP PUB NO 20130128256A1
SERIAL NO

13692865

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Abstract

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A map of the surface of a substrate is generated at a measurement station. The substrate is then moved to where a space between a projection lens and the substrate is filled with a liquid. The substrate is then aligned using, for example, a transmission image sensor and, using the previous mapping, the substrate can be accurately exposed. Thus the mapping does not take place in a liquid environment.

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Patent Owner(s)

Patent OwnerAddress
ASML NETHERLANDS B V5500 AH VELDHOVEN

International Classification(s)

Inventor(s)

Inventor Name Address # of filed Patents Total Citations
De, Smit Joannes Theodoor Eindhoven, NL 50 5946
Lof, Joeri Eindhoven, NL 94 8170
Loopstra, Erik Roelof Heeze, NL 325 13468
Meijer, Hendricus Johannes Maria Veldhoven, NL 45 2812
Modderman, Theodorus Marinus Nuenen, NL 39 4357
Mulkens, Johannes Catharinus Hubertus Maastricht, NL 213 10886
Ritsema, Roelof Aeilko Siebrand Eindhoven, NL 37 4991
Simon, Klaus Eindhoven, NL 89 7360

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