METHOD OF MANUFACTURING THIN FILM CAPACITOR AND THIN FILM CAPACITOR

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United States of America Patent

SERIAL NO

13675670

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Abstract

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A method of manufacturing a thin film capacitor, having: a base electrode; dielectric layers consecutively deposited on the base electrode; an internal electrode deposited between the dielectric layers; an upper electrode deposited opposite the base electrode with the dielectric layers and the internal electrode being interposed therebetween; and a cover layer deposited on the upper electrode, has depositing an upper electrode layer which is to be the upper electrode, and a cover film which is to be the cover layer on the unsintered dielectric film which is to be the dielectric layer, to fabricate a lamination component, and sintering the lamination component.

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Patent Owner(s)

Patent OwnerAddress
TDK CORPORATIONTOKYO 103-6128

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
OIKAWA, Yasunobu Tokyo, JP 25 159
YANO, Yoshihiko Tokyo, JP 72 1754

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