BATCH PROCESSING FOR ELECTROMECHANICAL SYSTEMS AND EQUIPMENT FOR SAME
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United States of America Patent
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Issued Date -
May 23, 2013
app pub date -
Nov 21, 2011
filing date -
Nov 21, 2011
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Abstract
This disclosure provides systems, methods and apparatus for processing multiple substrates in a batch cluster tool. A batch cluster tool can include a transfer chamber, an etch process chamber, and one or both of an ALD process chamber and an SAM process chamber. Multiple substrates are transferred from a transfer chamber into an etch chamber. The substrates are exposed to a vapor phase etchant. The substrates can then transferred to an atomic layer deposition (ALD) chamber and exposed to vapor phase reactants to form a thin film on the substrates by ALD. The substrates can be transferred either from the etch process chamber or the ALD chamber to a third chamber and exposed to vapor phase reactants to form a self-assembled monolayer (SAM) on the substrates.
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