Method for manufacturing photo mask, method for manufacturing semiconductor device, and program

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United States of America Patent

PATENT NO 8883373
SERIAL NO

13679396

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Abstract

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According to one embodiment, a method for manufacturing a photo mask, includes acquiring first data on respective shapes of a plurality of mask substrates, acquiring second data on respective shapes of a plurality of pellicles, and determining a combination of the mask substrate and the pellicle based on the first data and the second data.

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Patent Owner(s)

Patent OwnerAddress
KABUSHIKI KAISHA TOSHIBA1-1 SHIBAURA 1-CHOME MINATO-KU TOKYO 1050023 ?1050023

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Kyoh, Suigen Nagoya, JP 31 343
Mimotogi, Akiko Yokohama, JP 21 149
Nakasugi, Tetsuro Yokohama, JP 67 622

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