Recognition of template patterns with mask information
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United States of America Patent
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May 13, 2014
Grant Date -
May 23, 2013
app pub date -
Nov 23, 2011
filing date -
Nov 23, 2011
priority date (Note) -
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status (Latency Note)
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Abstract
Apparatus includes a machine readable storage medium for storing a template library having at least one template. The template is to include a first layout representation of at least one pattern to be formed by multi-patterning a single layer of an IC. The pattern has a plurality of portions to be formed using a plurality of respectively different photomasks. The first layout representation includes data identifying on which photomask each portion is to be located. An electronic design automation (EDA) tool includes a processor configured to receive a hardware description language representation of at least a part of a circuit and generate a second layout representation of the part of the circuit having a plurality of polygons. The EDA tool has a matching module that identifies and outputs an indication of whether one or more of the plurality of portions matches a subset of the plurality of polygons.
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