Hybrid Fin field-effect transistors

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United States of America Patent

PATENT NO 8723223
APP PUB NO 20130134522A1
SERIAL NO

13463869

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Abstract

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A hybrid Fin Field-Effect Transistor (FinFET) includes a first and a second FinFET. The first FinFET includes a first channel region formed of a first semiconductor fin, and a first source region and a first drain region of a first conductivity type. The second FinFET includes a second channel region formed of a second semiconductor fin, a second source region of a second conductivity type opposite the first conductivity type, and a second drain region of the first conductivity type. The second source region and the second drain region are connected to opposite ends of the second channel region. The first and the second gate electrodes are interconnected. The first and the second source regions are electrically interconnected. The first and the second drain regions are electrically interconnected.

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Patent Owner(s)

Patent OwnerAddress
TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY LTD8 LI-HSIN RD 6 HSINCHU SCIENCE PARK HSINCHU 300-78

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Bhuwalka, Krishna Kumar Asansol, IN 38 549

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