Electrical connection structure

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United States of America Patent

PATENT NO 8476759
APP PUB NO 20130134563A1
SERIAL NO

13308249

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Abstract

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A structure comprises a top metal connector formed underneath a bond pad. The bond pad is enclosed by a first passivation layer and a second passivation layer. A polymer layer is further formed on the second passivation layer. The dimension of an opening in the first passivation layer is less than the dimension of the top metal connector. The dimension of the top metal connector is less than the dimensions of an opening in the second passivation layer and an opening in the polymer layer.

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Patent Owner(s)

Patent OwnerAddress
TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY LTD8 LI-HSIN RD 6 HSINCHU SCIENCE PARK HSINCHU 300-78

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Chen, Chen-Shien Zhubei, TW 407 8285
Chuang, Yao-Chun Taipei, TW 94 790
Huang, Chang-Chia Hsin-Chu, TW 36 375
Kuo, Chen-Cheng Chu-Pei, TW 104 2218
Lin, Tsung-Shu New Taipei, TW 117 964

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