System for attachment of an electrode into a plasma source

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United States of America Patent

PATENT NO 9053895
APP PUB NO 20130134855A1
SERIAL NO

13307830

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Abstract

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An inductively coupled plasma charged particle source for focused ion beam systems includes a plasma reaction chamber with a removably attached source electrode. A fastening mechanism connects the source electrode with the plasma reaction chamber and allows for a heat-conductive, vacuum seal to form. With a removable source electrode, improved serviceability and reuse of the plasma source tube are now possible.

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Patent Owner(s)

  • FEI COMPANY

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Graupera, Anthony Hillsboro, US 18 216
Kellogg, Sean Portland, US 19 159
Parker, N William Hillsboro, US 55 1759
Schwind, Gregory A Portland, US 20 116
Skoczylas, Walter Aloha, US 5 74
Smith, Noel Portland, US 45 546
Utlaut, Mark W Scappoose, US 40 591
Wells, Andrew B Portland, US 6 68
Zhang, Shouyin Portland, US 21 149

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