Liquid recovery apparatus, exposure apparatus, exposure method, and device manufacturing method
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United States of America Patent
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Oct 21, 2014
Issued Date -
N/A
app pub date -
Jan 28, 2013
filing date -
Aug 29, 2003
priority date (Note) -
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Abstract
A liquid immersion exposure apparatus that exposes a substrate via a projection optical system and liquid includes a movable member having an upper surface, a part of which holds the substrate. A liquid immersion system that has a supply port and a recovery port supplies the liquid to a space between the projection optical system and the upper surface via the supply port of a supply path and recovers the liquid of a liquid immersion region formed in the space via the recovery port of a recovery path. A flow path is connected to the supply path between the supply port and a source of the liquid, the flow path permitting flow therethrough to remove liquid that remains in the supply path, the liquid that remains in the supply path having been supplied from the source of the liquid without being discharged from the supply port.
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