MANUFACTURING METHOD FOR CRYSTALLINE SEMICONDUCTOR FILM, SEMICONDUCTOR DEVICE, AND DISPLAY DEVICE

United States of America Patent

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Issued Date
Jun 6, 2013
app pub date
Mar 29, 2011
filing date
Jun 7, 2010

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Abandoned

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Abstract

An object is to form a crystalline semiconductor film including a plurality of semiconductor regions with different average grain sizes by a simple manufacturing process.

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Patent Owner(s)

Patent Owner	Address
SHARP KABUSHIKI KAISHA	1 TAKUMI-CHO SAKAI-KU SAKAI CITY OSAKA 5908522 ?5908522

International Classification(s)

H01L:SEMICONDUCTOR DEVICES; ELECTRIC SOLID STATE DEVICE....

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[Patents Count]

Inventor(s)

Inventor Name	Address	# of filed Patents	Total Citations
Nakamura, Yoshinobu	Osaka-shi, JP	112	1690

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MANUFACTURING METHOD FOR CRYSTALLINE SEMICONDUCTOR FILM, SEMICONDUCTOR DEVICE, AND DISPLAY DEVICE

Number of patents in Portfolio can not be more than 2000

United States of America Patent

13701536

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13701536

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