MEMS device etch stop
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United States of America Patent
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Jan 21, 2014
Grant Date -
Jun 6, 2013
app pub date -
Feb 1, 2013
filing date -
Apr 18, 2011
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Abstract
The present disclosure provides a micro-electro-mechanical systems (MEMS) device and a method for fabricating such a device. In an embodiment, a MEMS device includes a substrate, a dielectric layer above the substrate, an etch stop layer above the dielectric layer, and two anchor plugs above the dielectric layer, the two anchor plugs each contacting the etch stop layer or a top metal layer disposed above the dielectric layer. The device further comprises a MEMS structure layer disposed above a cavity formed between the two anchor plugs and above the etch stop layer from release of a sacrificial layer.
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