Apparatus and methods for keeping immersion fluid adjacent to an optical assembly during wafer exchange in an immersion lithography machine
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United States of America Patent
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Jun 3, 2014
Grant Date -
Jun 6, 2013
app pub date -
Jan 30, 2013
filing date -
Mar 15, 2007
priority date (Note) -
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Abstract
A lithographic projection apparatus includes a projection optical assembly having a final optical element, a stage assembly including a substrate table on which a substrate is supported, the substrate supported by the substrate table being exposed with an exposure beam from the final optical element of the projection optical assembly through an immersion liquid, a confinement member which encircles a portion of a path of the exposure beam, and a movable member which is movable in a space between the confinement member and the substrate, the substrate table, or both, the space being divided by the movable member into a first portion between the confinement member and the movable member and a second portion between the movable member and the substrate, the substrate table, or both. The movable member has a recovery outlet from which the immersion liquid in the second portion is removed.
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