Rapid thermal annealing to reduce pattern effect
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United States of America Patent
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Jun 17, 2014
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app pub date -
Jan 30, 2013
filing date -
Oct 5, 2010
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Abstract
A method of performing rapid thermal annealing on a substrate including heating the substrate to a first temperature in a rapid thermal annealing system having a front-side heating source and a backside heating source. The method further includes raising the temperature of the substrate from the first temperature to a second temperature greater than the first temperature. The backside heating source provides a greater amount of heat than the front-side heating source during the raising of the temperature of the substrate.
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