Systems and methods providing electron beam writing to a medium
Number of patents in Portfolio can not be more than 2000
United States of America Patent
Stats
-
Dec 17, 2013
Grant Date -
Jun 13, 2013
app pub date -
Feb 1, 2013
filing date -
Mar 18, 2011
priority date (Note) -
In Force
status (Latency Note)
Importance
Abstract
A method for electron-beam writing to a medium includes positioning the medium within an e-beam writing machine so that the medium is supported by a stage and is exposed to an e-beam source. The method also includes writing a pattern to the medium using a plurality of independently-controllable beams of the e-beam source, in which the pattern comprises a plurality of parallel strips. Each of the parallel strips is written using multiple ones of the independently-controllable beams.
First Claim
Family
International Classification(s)
- [Classification Symbol]
- [Patents Count]
Cited Art Landscape
Patent Citation Ranking
Advertisement
Advertisement
Advertisement
Recipient Email Address
Recipient Email Address
Comment
Recipient Email Address
Add to Portfolio(s)
To add this patent to one, or more, of your portfolios, simply click the add button.
This Patent is in these Portfolios:
Add to additional portfolios:
Last Refreshed On:
Changes done successfully