Imprinting stamp and nano-imprinting method using the same
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United States of America Patent
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Jun 7, 2016
Grant Date -
Jun 13, 2013
app pub date -
Sep 14, 2012
filing date -
Dec 13, 2011
priority date (Note) -
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status (Latency Note)
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Abstract
An imprinting stamp and a nano-imprinting method using the imprinting stamp are provided. The imprinting stamp includes a first substrate; one or more field regions on the first substrate, the first substrate including nano-patterns; and a first dummy pattern region on the first substrate and adjacent to the field region, the dummy pattern region including first dummy patterns having greater dimensions than that of the nano-patterns, the first dummy patterns being a plurality of polygons, each of the polygons having a vertex pointing in a first direction proceeding from the field region toward the first dummy pattern region.
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