DEVICE FOR PROVIDING A FLOW OF PLASMA
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United States of America Patent
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Issued Date -
Jun 13, 2013
app pub date -
Jun 13, 2012
filing date -
Jun 17, 2011
priority date (Note) -
Abandoned
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Abstract
A device for forming at an ambient atmospheric pressure a gaseous plasma comprising active species for treatment of a treatment region. The device comprises a plasma cell for forming the gaseous plasma for treating the treatment region. The plasma cell comprises an inlet for receiving gas from a source and an outlet for discharging active species generated in the cell. A dielectric substrate made of a polyimide encloses the flow path for gas conveyed from the inlet to the outlet and an electrode is formed on the dielectric substrate for energising gas along the flow path to form the active species. A protective coating or lining is located on an inner surface of the dielectric substrate for resisting reaction of the active species generated in the plasma cell with the material of the dielectric substrate.
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