Exposure apparatus

Number of patents in Portfolio can not be more than 2000

United States of America Patent

PATENT NO 9470984
SERIAL NO

13758327

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Importance

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Abstract

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An exposure apparatus that can prevent disadvantages due to a leaked liquid is provided. The exposure apparatus includes a substrate holder that includes a peripheral wall portion and supporting portions located on an inside of the peripheral wall portion and that supports a substrate with the supporting portions by negatively pressurizing a space surrounded by the peripheral wall portion, and a recovery mechanism that includes a collection inlets provided on the inside of the peripheral wall portion and a vacuum system connected to the collection inlets, in which a liquid penetrated from an outer periphery of the substrate is sucked and recovered, in the state with an upper surface of the peripheral wall portion and a back surface of the substrate being spaced at a first distance.

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Patent Owner(s)

Patent OwnerAddress
NIKON CORPORATIONTOKYO 140-8601

International Classification(s)

Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Shibuta, Makoto Kumagaya, JP 19 281

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